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Titlebook: Evaluation of Advanced Semiconductor Materials by Electron Microscopy; David Cherns Conference proceedings 1989 Plenum Press, New York 198

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樓主: 夸大
21#
發(fā)表于 2025-3-25 03:52:31 | 只看該作者
Franz Wever,Otto Krisement,Hanna Sch?dlerfeatures in RHEED patterns from semiconductor surfaces and, in particular, describe some of the most significant features of rocking curves. Finally, I will examine the phenomenon of variations and oscillations of the intensity of RHEED patterns during epitaxial growth.
22#
發(fā)表于 2025-3-25 10:41:55 | 只看該作者
23#
發(fā)表于 2025-3-25 14:00:10 | 只看該作者
24#
發(fā)表于 2025-3-25 17:36:12 | 只看該作者
25#
發(fā)表于 2025-3-25 19:58:41 | 只看該作者
Strains and Misfit Dislocations at Interfaceslectron Diffraction (CBED) for the measurement of local strain, and we will describe the use of a new technique, Convergent Beam Imaging (CBIM), for detecting, mapping and measuring small crystalline distortions.
26#
發(fā)表于 2025-3-26 02:40:24 | 只看該作者
27#
發(fā)表于 2025-3-26 05:32:21 | 只看該作者
28#
發(fā)表于 2025-3-26 09:25:48 | 只看該作者
Image Processing Applied to HRTEM Images of Interfacestunities to extract the relevant part of the information, thus simplifying the interpretation of the image. Several textbooks have appeared. which give an introduction into the subject of image processing in electron microscopy, with main applications in biology and organic materials. For these samp
29#
發(fā)表于 2025-3-26 15:26:46 | 只看該作者
30#
發(fā)表于 2025-3-26 20:27:23 | 只看該作者
High Resolution Electron Microscopy Study of Indium Distribution in InAs/GaAs Multilayers(HRTEM) in order to determine the Indium location. X-Ray diffraction has provided the thickness and periodicity of the multilayers. The ones chosen were respectively A : 0.9 monolayer (mL) and B : 1.7 mL thick according to XR measurements. From comparison of their structure we conclude that Indium i
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