Titlebook: Nanofabrication; Principles, Capabili Zheng Cui Book 2024Latest edition The Editor(s) (if applicable) and The Author(s), under exclusive li

前兆

關(guān)節(jié)炎

Introduction,nto a functioning system, the planar process relies on various lithography methods to pattern polymer resists and transfer the resist patterns into substrate materials. A functioning system is built up layer by layer. As the introduction of nanofabrication, this chapter gives an overview of the plan

聾子

Optical Lithography,logy has been developed so advanced that it is now capable of sub-10?nm patterning resolution. Starting from the most basic equation of diffractive optics (Eq. .), this chapter describes the principles of optical lithography in very accessible manner, helped visually by many graphs of computer-simul

祖先

MUTE

indices

恃強(qiáng)凌弱的人

Nanoimprint Lithography,d is made, the patterning process is just repeated replication of the mold, which can be high throughput and low cost. Nanoimprint lithography (NIL) covered by this chapter includes thermal, UV cured, and soft contact techniques. For each type of NIL technology, their relevant molds and polymers are

Lipohypertrophy

jovial

Nanoscale Pattern Transfer by Deposition,, the way how the thin film is deposited plays a key role. This chapter starts with an overview of thin film deposition technology and emphasizes the importance of deposition directionality on the successful liftoff of film from a patterned resist mask. Although thermal evaporation deposition has go

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