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Titlebook: MEMS Materials and Processes Handbook; Reza Ghodssi,Pinyen Lin Book 2011 Springer Science+Business Media, LLC 2011

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書(shū)目名稱MEMS Materials and Processes Handbook
編輯Reza Ghodssi,Pinyen Lin
視頻videohttp://file.papertrans.cn/621/620113/620113.mp4
概述Provides a comprehensive catalog of various microfabrication processes, each with a brief introduction to the technology, as well as examples of common uses in MEMS.Discusses specific MEMS fabrication
叢書(shū)名稱MEMS Reference Shelf
圖書(shū)封面Titlebook: MEMS Materials and Processes Handbook;  Reza Ghodssi,Pinyen Lin Book 2011 Springer Science+Business Media, LLC 2011
描述.MEMs Materials and Processes Handbook" is a comprehensive reference for researchers searching for new materials, properties of known materials, or specific processes available for MEMS fabrication. The content is separated into distinct sections on "Materials" and "Processes". The extensive Material Selection Guide" and a "Material Database" guides the reader through the selection of appropriate materials for the required task at hand. The "Processes" section of the book is organized as a catalog of various microfabrication processes, each with a brief introduction to the technology, as well as examples of common uses in MEMs..
出版日期Book 2011
版次1
doihttps://doi.org/10.1007/978-0-387-47318-5
isbn_ebook978-0-387-47318-5Series ISSN 1936-4407 Series E-ISSN 1936-4415
issn_series 1936-4407
copyrightSpringer Science+Business Media, LLC 2011
The information of publication is updating

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Additive Processes for Piezoelectric Materials: Piezoelectric MEMS,ostatically driven MEMS resonator and filters operating in cellular phone frequency bands (nominally 0.7–6?GHz). In addition to FBAR technology, piezoelectric actuation/sensing is being examined for a host of applications including RF MEMS, small-scale robotics, resonant mass sensors, and energy har
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Dry Etching for Micromachining Applications,the reader with a broad understanding of the parameters that influence the results in dry etching techniques and to provide information that is useful to explore dry etching processes for the fabrication of next-generation MEMS devices. Practical recipes suitable for most commonly used plasma reacto
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MEMS Lithography and Micromachining Techniques,n beam lithography, and nanoimprint lithography. This chapter presents an introduction and practical approach to lithography and micromachining techniques in the context of MEMS device fabrication. The topics that are discussed here include: UV lithography, grayscale lithography, e-beam lithography,
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Wafer Bonding,devices, to encapsulate the MEMS device in an hermetic environment, and to transfer bond a complete MEMS device to a wafer with integrated circuits. Wafer bonding has found its earliest applications for pressure sensors and accelerometers, but the applications remain boundless.
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MEMS Packaging Materials,ging also provides mechanical support to the sensitive chip, facilitating the handling of the chip, and simplifying assembly. This chapter emphasizes the materials involved in packaging MEMS devices and the addresses the challenges involved. Included in this chapter are several case studies demonstr
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