Titlebook: Ion Beams in Nanoscience and Technology; Ragnar Hellborg,Harry J. Whitlow,Yanwen Zhang Book 20101st edition Springer-Verlag Berlin Heidelb

certitude

Particle Acceleration and Detectionhttp://image.papertrans.cn/i/image/475142.jpg

Militia

978-3-642-26137-4Springer-Verlag Berlin Heidelberg 2010

calumniate

Ion Beams in Nanoscience and Technology978-3-642-00623-4Series ISSN 1611-1052 Series E-ISSN 2365-0877

HAVOC

https://doi.org/10.1007/978-3-642-00623-4Cluster; Tissue Engineering; crystal; electron microscopy; microscopy; nanomaterial; nanoparticle

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公式

critique

纖細(xì)

違反

Box 2: Sputtering ion-target combination and the ion energy, the number of target atoms expelled at perpendicular incidence may vary from the detection limit of 10. to tens of thousands. The most basic parameter of sputtering is the ., defined as the ratio between the number of incident particles and emitted atoms.

Coterminous