Titlebook: Electron Microbeam Analysis; Abraham Boekestein (Head Department Instrumental A Conference proceedings 1992 Springer-Verlag Wien 1992 cera

遷移

Fester

Quantitative EPMA of the Ultra-Light Elements Boron Through Oxygen,eaks in order to deal with the strong alterations in the peak shapes that sometimes occur. It is demonstrated that when these effects are properly accounted for and a good matrix correction program in conjunction with consistent mass absorption coefficients is used good quantitative results can be obtained.

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,Comparison of Φ (ρz) Curve Models in EPMA,sed by Sewell et al. and Pouchou and Pichoir’s model. In general, all the tested models showed similar performances. Finally the advantages of the models related to basic principles over the mathematically optimized ones are considered.

漫步

Monte Carlo Simulation of Backscattered and Secondary Electron Profiles,ctrons. In the present paper first simulations are discussed with the aim of comparing backscattered electron and secondary electron profiles of wall and trench structures. Special attention is given to the influence of the shape of the target surface topography on the electron backscattering and secondary emission.

JAMB

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縱火

ANNUL

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