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Titlebook: Defects and Impurities in Silicon Materials; An Introduction to A Yutaka Yoshida,Guido Langouche Book 2015 Springer Japan 2015 Atomistic In

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書目名稱Defects and Impurities in Silicon Materials
副標(biāo)題An Introduction to A
編輯Yutaka Yoshida,Guido Langouche
視頻videohttp://file.papertrans.cn/265/264723/264723.mp4
概述Provides the basic physics behind the modeling and evaluation techniques used in silicon materials science.Presents atomistic insight into the defects and the impurities in silicon materials such as U
叢書名稱Lecture Notes in Physics
圖書封面Titlebook: Defects and Impurities in Silicon Materials; An Introduction to A Yutaka Yoshida,Guido Langouche Book 2015 Springer Japan 2015 Atomistic In
描述This book emphasizesthe importance of the fascinating atomistic insights into the defects and theimpurities as well as the dynamic behaviors in silicon materials, which havebecome more directly accessible over the past 20 years. Such progress has beenmade possible by newly developed experimental methods, first principle theories,and computer simulation techniques.?.The book is aimed at young researchers, scientists, and technicians in related industries. The mainpurposes are to provide readers with 1) the basic physics behind defects insilicon materials, 2) the atomistic modeling as well as the characterizationtechniques related to defects and impurities in silicon materials, and 3) anoverview of the wide range of the research fields involved..
出版日期Book 2015
關(guān)鍵詞Atomistic Insights into Defects and Impurities; Atomistic Scale Modeling Techniques; Computer Simulati
版次1
doihttps://doi.org/10.1007/978-4-431-55800-2
isbn_softcover978-4-431-55799-9
isbn_ebook978-4-431-55800-2Series ISSN 0075-8450 Series E-ISSN 1616-6361
issn_series 0075-8450
copyrightSpringer Japan 2015
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Oxygen Precipitation in Silicon,pitates are described from the viewpoint of classical nucleation theory. The initial states of oxygen precipitation as suggested by ab initio calculation are also shown. Results about the impact of intrinsic point defects, doping, and co-doping on oxygen precipitation are presented. The most importa
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Defect Characterization in Silicon by Electron-Beam-Induced Current and Cathodoluminescence Techniqharacterization of extended defects in Si. For these purposes, we use a scanning electron microscope (SEM) for electron beam irradiation. The electric current induced at the internal circuit and light emission from the specimen are used for the imaging of EBIC and CL, respectively. Using these techn
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Nuclear Methods to Study Defects and Impurities in Si Materials,tomic and electronic configuration of this atom. In the field of defects and impurities in semiconductors, the study of their hyperfine interaction can therefore contribute substantially to their identification and characterization. The introduction of radioactive isotopes as impurity atoms allows t
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