Titlebook: Advances in Rapid Thermal and Integrated Processing; Fred Roozeboom Book 1996 Springer Science+Business Media B.V. 1996 Metall.Semiconduct

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The Thermal Radiative Properties of Semiconductors,The development of rapid thermal processing (RTP) techniques for the fabrication of advanced electronic devices requires a detailed understanding of the thermal radiative properties of semiconductor wafers. Fig. 1 illustrates the main reasons to be interested in these properties:

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Studies in Computational Intelligencetechnology is required for manufacturing processes. However, until recently RTP technology has been almost ignored by manufacturing due to low reproducibility in processing. The main reason for this situation is the fact that an alternative processing technology was widely available: the conventional batch processing furnace.

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J?rg Gebhardt,Aljoscha Klose,Jan Wendlerk. Other important storage technologies are optical, magneto-optical and magnetic recording. The subject of this chapter is related to high-density ., a technology that has existed now for over 100 years: the first proposal was published in 1888 [1].

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Book 1996ics and materials science. Here,the physics and engineering of this technology are discussed at thegraduate level. Three interrelated areas are covered. First, thethermophysics of photon-induced annealing of semiconductor and relatedmaterials, including fundamental pyrometry and emissivity issues, t

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Introduction: History and Perspectives of Rapid Thermal Processing,uring 196 mm. [1]. In the course of 1995 the line width has been further reduced to 0.35 pm for the development of processors with some 5 metal levels, such as the Pentium Pro (or P6) processor, as part of a series of continuously shrinking microelectronics, which started after the first planar single transistor in 1959 [2].

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Temperature and Process Control in Rapid Thermal Processing,held in 1987, and the second in 1994. Obviously, process control for RTP is still an important issue. In the following, after a brief historical presentation, we will develop the background associated with RTP process control, together with the state-of-the-art. The specific issue of temperature measurement is presented in Chapter 3.

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