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Titlebook: Ultra-Fast Silicon Bipolar Technology; Ludwig Treitinger,Mitiko Miura-Mattausch Textbook 1988 Springer-Verlag Berlin Heidelberg 1988 VLSI.

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書(shū)目名稱Ultra-Fast Silicon Bipolar Technology
編輯Ludwig Treitinger,Mitiko Miura-Mattausch
視頻videohttp://file.papertrans.cn/941/940404/940404.mp4
叢書(shū)名稱Springer Series in Electronics and Photonics
圖書(shū)封面Titlebook: Ultra-Fast Silicon Bipolar Technology;  Ludwig Treitinger,Mitiko Miura-Mattausch Textbook 1988 Springer-Verlag Berlin Heidelberg 1988 VLSI.
描述Since the first bipolar transistor was investigated in 1947, enormous efforts have been devoted to semiconductor devices. The strong world- wide competition in fabricating metal-oxide-semiconductor field-effect of develop- transistor (MOSFET) memories has accelerated the pace ments in semiconductor technology. Bipolar transistors play a major role due to their high-speed performance. Delay times of about 20 ps per gate have already been achieved. Because of this rapid technologi- cal progress, it is difficult to predict the future with any certainty. In 1987 a special session on ultrafast bipolar transistors was held at the European Solid-State Device Research Conference. Its aim was to sum- marize the most recent developments and to discuss the future of bip- olar transistors. This book is based on that session but also includes contributions by other participants, such that a broad range of up-to- is presented. Several conclusions can be drawn from date information this information: the first and most important is the very large poten- tial for future progress still existing in this field. This progress is char- acterized by the drive towards higher speed and lower power con- sum
出版日期Textbook 1988
關(guān)鍵詞VLSI; circuit; epitaxy; integrated circuit; silicon; simulation; transistor
版次1
doihttps://doi.org/10.1007/978-3-642-74360-3
isbn_softcover978-3-642-74362-7
isbn_ebook978-3-642-74360-3Series ISSN 0172-5734
issn_series 0172-5734
copyrightSpringer-Verlag Berlin Heidelberg 1988
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沙發(fā)
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978-3-642-74362-7Springer-Verlag Berlin Heidelberg 1988
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Ultra-Fast Silicon Bipolar Technology978-3-642-74360-3Series ISSN 0172-5734
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History, Present Trends, and Scaling of Silicon Bipolar Technology, Physics for their epochal invention. Since then, bipolar transistors have been widely used for many purposes. Applications can be divided into two broad categories: amplification and switching. As an amplifier more than a factor of 100 in amplification is available and a switching speed in the sub-ns range can be obtained.
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發(fā)表于 2025-3-22 15:04:08 | 只看該作者
Vertical Scaling Considerations for Polysilicon-Emitter Bipolar Transistors,e of polycrystalline silicon (poly-Si) as diffusion source and contact material for the emitter. Besides facilitating the second important achievement, self-alignment between emitter and base contact, the poly-Si emitter has the following major advantages:
7#
發(fā)表于 2025-3-22 19:43:16 | 只看該作者
Advanced Self-Alignment Technologies and Resulting Structures of High-Speed Bipolar transistors, high-speed circuits are constructed and their excellent performance is nearly equal to that of GaAs devices. Other high-speed transistor structures are demonstrated, and sub- 50ps ECL circuits are predicted.
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Self-Aligning Technology for Sub-100nm Deep Base Junction Transistors,a self-aligned bipolar transistor. The new technology, BSA (BSG Self-Aligned) technology, features the use of BSG film as a sidewall spacer between the emitter and base electrodes as well as the diffusion source for the intrinsic base and also for the p.-link region between the intrinsic and extrins
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