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Titlebook: Rolling Contact Fatigue in a Vacuum; Test Equipment and C Michael Danyluk,Anoop Dhingra Book 2015 Springer International Publishing Switzer

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樓主: Inveigle
21#
發(fā)表于 2025-3-25 05:57:21 | 只看該作者
22#
發(fā)表于 2025-3-25 10:49:13 | 只看該作者
Ion-Plating Process Model cost projection and resources requirements based on customer demand and raw material availability. Many of these tools may be run in Microsoft Excel which further enhances their usefulness, and many are based on a run-to-run comparison philosophy.
23#
發(fā)表于 2025-3-25 12:30:57 | 只看該作者
Book 2015bles rapid accumulation of stress cycles compared with testing in oil at atmospheric pressure. The authors’ lucid and authoritative narrative broadens readers‘ understanding of the benefits of UHV testing: a cleaner, shorter test is achieved in high vacuum, disturbance rejection by the deposition co
24#
發(fā)表于 2025-3-25 18:40:27 | 只看該作者
Vacuum Chamber Designting of rotating systems to detect balance shift is also discussed, with emphasis on vibration transmittance through key vacuum components. Two case studies are explored that highlight the balance between cost and complexity related to chamber design and its long-term operation.
25#
發(fā)表于 2025-3-25 22:08:43 | 只看該作者
Closing Chapter: Disturbance Rejectionsticated control characteristics such as disturbance rejection and adaptive control. Adaptive control schemes rely on predictive control algorithms that require some knowledge of system behavior. The combination of plasma feedback and adaptive control would enable very good disturbance rejection algorithms.
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發(fā)表于 2025-3-26 01:10:27 | 只看該作者
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發(fā)表于 2025-3-26 06:07:26 | 只看該作者
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發(fā)表于 2025-3-26 09:20:01 | 只看該作者
29#
發(fā)表于 2025-3-26 15:12:05 | 只看該作者
Effects of Process Parameters on Film RCF Life-voltage plasma, (ii) reduced film stress with lower-voltage plasma, and (iii) coating contamination from element redistribution. These trade-offs must be considered within the context of a large scale ion-plating process in which say 300 ball bearings are coated within a single process.
30#
發(fā)表于 2025-3-26 17:10:49 | 只看該作者
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