| 書目名稱 | Process Technology for Semiconductor Lasers |
| 副標(biāo)題 | Crystal Growth and M |
| 編輯 | Kenichi Iga,Susumu Kinoshita |
| 視頻video | http://file.papertrans.cn/760/759002/759002.mp4 |
| 叢書名稱 | Springer Series in Materials Science |
| 圖書封面 |  |
| 描述 | .Process Technology for Semiconductor Lasers .describes the design principles of semiconductor lasers, mainly from the fabrication point of view. A review is given of the history of semiconductor-laser development and applications and of the materials used in lasing at short to long wavelengths. The basic design principles for semiconductor-laser devices and the epitaxy for laser production are discussed. An entire chapter is devoted to the technology of liquid-phase epitaxy, and another one to vapor-phase and beam epitaxies. The characterizations of laser materials and the fabrication and characteristics of semiconductor lasers are treated. Mode-control techniques are presented, and surface-emitting lasers are introduced in the final chapter. |
| 出版日期 | Book 1996 |
| 關(guān)鍵詞 | Semiconductor Lasers; design; development; epitaxial crystal growth; history; laser; micro-processes; produ |
| 版次 | 1 |
| doi | https://doi.org/10.1007/978-3-642-79576-3 |
| isbn_softcover | 978-3-642-79578-7 |
| isbn_ebook | 978-3-642-79576-3Series ISSN 0933-033X Series E-ISSN 2196-2812 |
| issn_series | 0933-033X |
| copyright | Springer-Verlag Berlin Heidelberg 1996 |
|Archiver|手機(jī)版|小黑屋|
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