| 書目名稱 | Photovoltaic Power Generation |
| 副標題 | Proceedings of the S |
| 編輯 | R. Overstraeten,G. Caratti |
| 視頻video | http://file.papertrans.cn/747/746741/746741.mp4 |
| 叢書名稱 | Solar Energy and Development |
| 圖書封面 |  |
| 描述 | Amorphous silicon PV panel mass production will require to mas- ter plasma chemical deposition in terms of large sizes, cost, maintenance and all other problems related to industrialization. Since plasma deposition is a novel technique, the development of all this production related know how involves a considerable technical research effort. The major problems related to the design of a production deposi- tion machine are the following - deposition should be uniform on very large area substrate (typical dimension 1 meter) ; - the deposited amorphous silicon should have good electronic properties (density of state of the order or less than 16 3 10 cm /eV) and very low impurities concentrations (for exam- ple oxygen atomic concentration should idealy be less than 0. 01 %) ; - the film stress should be limited, the density of ponctual defects (particulates) should remain reasonable (less than 2 per 100 cm ) ; - dopant level control should be stable and efficient ; - silane consumption should remain reasonably efficient - financial cost being important the machine productivity should be high hence deposition rate optimized ; - downtime due to maintenance should be reduced to a minimum. |
| 出版日期 | Conference proceedings 1988 |
| 關鍵詞 | Substrat; hydrogen; material; solar cell |
| 版次 | 1 |
| doi | https://doi.org/10.1007/978-94-009-2933-3 |
| isbn_softcover | 978-94-010-7821-4 |
| isbn_ebook | 978-94-009-2933-3 |
| copyright | ECSC, EEC, EAEC, Brussels and Luxembourg 1988 |
|Archiver|手機版|小黑屋|
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