Titlebook: Nanoimprint Lithography: An Enabling Process for Nanofabrication; Weimin Zhou Book 2013 Springer-Verlag Berlin Heidelberg 2013 Light Emitt

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Nanoimprint Lithography Resists,ed portion becomes insoluble to the photoresist developer, and an exposed portion of the photoresists is soluble to the photoresist developer [1]. Figure 5.1 shows the basic microlithography process of photoresists.

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Nanoimprint Lithography Process,ontrolling of pattern defect, alignment, and full area imprinted pattern are among the hot topics. Recently, a great deal of attention has been paid to soft UV nanoimprint because of the full area conformal contact with the substrate.

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, nanotechnology and nanofabrication, material, physical, chemical, electric engineering and biology. .Dr. Weimin Zhou is an associate professor at Shanghai Nanotechnology Promotion Center, China.978-3-662-51086-5978-3-642-34428-2

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Nanoimprint Lithography: An Enabling Process for Nanofabrication978-3-642-34428-2

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