| 書(shū)目名稱 | Metal Impurities in Silicon-Device Fabrication |
| 編輯 | Klaus Graff |
| 視頻video | http://file.papertrans.cn/632/631426/631426.mp4 |
| 叢書(shū)名稱 | Springer Series in Materials Science |
| 圖書(shū)封面 |  |
| 描述 | .Metal Impurities in Silicon-Device Fabrication. treats the transition-metal impurities generated during silicon sample and device fabrication. The different mechanisms responsible for contamination are discussed, and a survey given of their impact on device performance. The specific properties of main and rare impurities in silicon are examined, as well as the detection methods and requirements in modern technology. Finally, impurity gettering is studied along with modern techniques to determine gettering efficiency. In all of these subjects, reliable and up-to-date data are presented. The monograph provides a thorough review of the results of recent scientific investigations, as well as of the relevant data and properties of the various metal impurities in silicon. |
| 出版日期 | Book 19951st edition |
| 關(guān)鍵詞 | Scandium; Tantal; chromium; cobalt; copper; gold; mercury; metals; nickel; platinum; silicon; spectroscopy; surf |
| 版次 | 1 |
| doi | https://doi.org/10.1007/978-3-642-97593-6 |
| isbn_ebook | 978-3-642-97593-6Series ISSN 0933-033X Series E-ISSN 2196-2812 |
| issn_series | 0933-033X |
| copyright | Springer-Verlag Berlin Heidelberg 1995 |
|Archiver|手機(jī)版|小黑屋|
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