| 書目名稱 | Design for Manufacturability and Yield for Nano-Scale CMOS |
| 編輯 | Charles C. Chiang,Jamil Kawa |
| 視頻video | http://file.papertrans.cn/269/268643/268643.mp4 |
| 概述 | Addressing a new topic (DFM/DFY) critical at 90 nm and beyond.No book available today with comprehensive coverage of this topic.Book covers all CAD/CAE aspects of a SOC design flow |
| 叢書名稱 | Integrated Circuits and Systems |
| 圖書封面 |  |
| 描述 | .Design for Manufacturability and Yield for Nano-Scale CMOS. walks the reader through all the aspects of manufacturability and yield in a nano-CMOS process and how to address each aspect at the proper design step starting with the design and layout of standard cells and how to yield-grade libraries for critical area and lithography artifacts through place and route, CMP model based simulation and dummy-fill insertion, mask planning, simulation and manufacturing, and through statistical design and statistical timing closure of the design. It alerts the designer to the pitfalls to watch for and to the good practices that can enhance a design’s manufacturability and yield. This book is a must read book the serious practicing IC designer and an excellent primer for any graduate student intent on having a career in IC design or in EDA tool development.. |
| 出版日期 | Book 2007 |
| 關(guān)鍵詞 | CAD (Computer aided design); CAE (Computer aided engineering); CMOS; Standard; classification; computer-a |
| 版次 | 1 |
| doi | https://doi.org/10.1007/978-1-4020-5188-3 |
| isbn_softcover | 978-90-481-7303-7 |
| isbn_ebook | 978-1-4020-5188-3Series ISSN 1558-9412 Series E-ISSN 1558-9420 |
| issn_series | 1558-9412 |
| copyright | Springer Science+Business Media B.V. 2007 |
|Archiver|手機(jī)版|小黑屋|
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