SCIE期刊Plasma Processes and Polymers 2024/2025影響因子:2.953 (PLASMA PROCESS POLYM) (1612-8850). (PHYSICS, FLUIDS & PLASMAS)

Odious

SCIE(SCI)期刊Plasma Processes and Polymers(20 21 REV HIST)影響因子


SCIE(SCI)期刊Plasma Processes and Polymers(PLASMA PROCESS POLYM)影響因子@(流體與等離子體物理學(xué))學(xué)科排名


SCIE(SCI)期刊Plasma Processes and Polymers(20 21 REV HIST)總引論文


SCIE(SCI)期刊Plasma Processes and Polymers(PLASMA PROCESS POLYM)總引論文@(流體與等離子體物理學(xué))學(xué)科排名


SCIE(SCI)期刊Plasma Processes and Polymers(20 21 REV HIST)影響因子


SCIE(SCI)期刊Plasma Processes and Polymers(PLASMA PROCESS POLYM)總引頻次@(流體與等離子體物理學(xué))學(xué)科排名


SCIE(SCI)期刊Plasma Processes and Polymers(20 21 REV HIST)即時影響因子


SCIE(SCI)期刊Plasma Processes and Polymers(PLASMA PROCESS POLYM)即時影響因子@(流體與等離子體物理學(xué))學(xué)科排名


SCIE(SCI)期刊Plasma Processes and Polymers(20 21 REV HIST)五年累積影響因子


SCIE(SCI)期刊Plasma Processes and Polymers(PLASMA PROCESS POLYM)五年累積影響因子@(流體與等離子體物理學(xué))學(xué)科排名

BOLT

Submitted on: 13 February 2014. Revised on: 20 March 2014. Accepted on: 06 April 2014. Plasma Processes and Polymers---WILEY-V C H VERLAG GMBH

尊嚴

Submitted on: 03 May 2009. Revised on: 05 June 2009. Accepted on: 25 June 2009. Plasma Processes and Polymers

裂隙

助記

Submitted on: 03 January 2001. Revised on: 25 January 2001. Accepted on: 01 February 2001. Plasma Processes and Polymers---WILEY-V C H VERLAG GMBH

600

Defense

Culmination

Tortuous

Submitted on: 24 October 2002. Revised on: 28 November 2002. Accepted on: 16 December 2002. Plasma Processes and Polymers---WILEY-V C H VERLAG GMBH

Crepitus

Submitted on: 28 September 2009. Revised on: 01 November 2009. Accepted on: 11 November 2009. Plasma Processes and Polymers---WILEY-V C H VERLAG GMBH