SCIE期刊PLASMA CHEMISTRY AND PLASMA PROCESSING 2024/2025影響因子:2.613 (PLASMA CHEM PLASMA P) (0272-4324). (PHYSICS, APPLIED)

Body-Mass-Index

SCIE(SCI)期刊PLASMA CHEMISTRY AND PLASMA PROCESSING(20 21 REV HIST)影響因子


SCIE(SCI)期刊PLASMA CHEMISTRY AND PLASMA PROCESSING(PLASMA CHEM PLASMA P)影響因子@(應(yīng)用物理學(xué))學(xué)科排名


SCIE(SCI)期刊PLASMA CHEMISTRY AND PLASMA PROCESSING(20 21 REV HIST)總引論文


SCIE(SCI)期刊PLASMA CHEMISTRY AND PLASMA PROCESSING(PLASMA CHEM PLASMA P)總引論文@(應(yīng)用物理學(xué))學(xué)科排名


SCIE(SCI)期刊PLASMA CHEMISTRY AND PLASMA PROCESSING(20 21 REV HIST)影響因子


SCIE(SCI)期刊PLASMA CHEMISTRY AND PLASMA PROCESSING(PLASMA CHEM PLASMA P)總引頻次@(應(yīng)用物理學(xué))學(xué)科排名


SCIE(SCI)期刊PLASMA CHEMISTRY AND PLASMA PROCESSING(20 21 REV HIST)即時影響因子


SCIE(SCI)期刊PLASMA CHEMISTRY AND PLASMA PROCESSING(PLASMA CHEM PLASMA P)即時影響因子@(應(yīng)用物理學(xué))學(xué)科排名


SCIE(SCI)期刊PLASMA CHEMISTRY AND PLASMA PROCESSING(20 21 REV HIST)五年累積影響因子


SCIE(SCI)期刊PLASMA CHEMISTRY AND PLASMA PROCESSING(PLASMA CHEM PLASMA P)五年累積影響因子@(應(yīng)用物理學(xué))學(xué)科排名

Initiative

長矛

Submitted on: 29 October 2003. Revised on: 22 November 2003. Accepted on: 28 November 2003. PLASMA CHEMISTRY AND PLASMA PROCESSING

憎惡

Submitted on: 29 May 2000. Revised on: 11 June 2000. Accepted on: 03 July 2000. PLASMA CHEMISTRY AND PLASMA PROCESSING

dainty

Submitted on: 02 November 2015. Revised on: 07 December 2015. Accepted on: 01 January 2016. PLASMA CHEMISTRY AND PLASMA PROCESSING

補角

Submitted on: 26 October 2008. Revised on: 17 November 2008. Accepted on: 26 November 2008. PLASMA CHEMISTRY AND PLASMA PROCESSING

GROUP

Submitted on: 19 October 2019. Revised on: 02 December 2019. Accepted on: 11 December 2019. PLASMA CHEMISTRY AND PLASMA PROCESSING

Patrimony

Submitted on: 19 August 2000. Revised on: 28 August 2000. Accepted on: 25 September 2000. PLASMA CHEMISTRY AND PLASMA PROCESSING

cauda-equina

Submitted on: 11 June 2013. Revised on: 09 July 2013. Accepted on: 04 August 2013. PLASMA CHEMISTRY AND PLASMA PROCESSING

PLIC

Submitted on: 22 January 2006. Revised on: 06 February 2006. Accepted on: 12 February 2006. PLASMA CHEMISTRY AND PLASMA PROCESSING