Titlebook: Chemical Vapour Deposition of Diamond for Dental Tools and Burs; Waqar Ahmed,Htet Sein,St. John Crean Book 2014 The Editor(s) (if applicab

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Diamond Deposition onto Flat Substrates,bility and uniformity are key requirements. Diamond deposited onto silicon substrates has been widely researched using both microwave and hot filament chemical vapour deposition (CVD). In this chapter hot-filament CVD has been employed to deposit diamond onto flat substrates to prove that the proces

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Controlling Structure and Morphology,sion onto the substrate material. These film characteristics are in turn controlled by a number of factors including the VFCVD reactor parameters such as substrate temperature, substrate bias, pressure, methane concentration, plasma characteristics and affinity of the substrate for diamond nucleatio

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