Titlebook: Chemical Physics of Thin Film Deposition Processes for Micro- and Nano-Technologies; Yves Pauleau Book 2002 Kluwer Academic Publishers 200

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Deposition of Thin Films by Sputtering,ey have their specific advantages and simultaneously introduce given limitations. Below, selected PVD techniques will be classified and described in details. Special emphasis will be given to the group of sputtering techniques whereas high vacuum evaporation and its modifications go beyond the frame of this paper.

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Book 2002nderstanding of the growth of thin films and microstructures via thermally activated, laser induced, photon assisted, ion beam assisted, and plasma enhanced vapour deposition processes...A handbook for engineers and scientists and an introduction for students of microelectronics. .

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https://doi.org/10.1007/978-1-4020-9056-1nt mechanisms that will be explored in these lectures. The practical realisation of photo-assisted CVD can be complex but improved light sources and reactor designs now offers a wider choice in achieving a practical system. The choice of light sources, precursors and reaction chambers will be covered in some depth.

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