SCIE期刊ACS Applied Electronic Materials 2024/2025影響因子:4.346 (ACS APPL ELECTRON MA) (NULL). (ENGINEERING, ELECTRICAL & EL

onychomycosis

SCIE(SCI)期刊ACS Applied Electronic Materials(20 21 REV HIST)影響因子


SCIE(SCI)期刊ACS Applied Electronic Materials(ACS APPL ELECTRON MA)影響因子@(工程，電氣和電子)學(xué)科排名


SCIE(SCI)期刊ACS Applied Electronic Materials(20 21 REV HIST)總引論文


SCIE(SCI)期刊ACS Applied Electronic Materials(ACS APPL ELECTRON MA)總引論文@(工程，電氣和電子)學(xué)科排名


SCIE(SCI)期刊ACS Applied Electronic Materials(20 21 REV HIST)影響因子


SCIE(SCI)期刊ACS Applied Electronic Materials(ACS APPL ELECTRON MA)總引頻次@(工程，電氣和電子)學(xué)科排名


SCIE(SCI)期刊ACS Applied Electronic Materials(20 21 REV HIST)即時影響因子


SCIE(SCI)期刊ACS Applied Electronic Materials(ACS APPL ELECTRON MA)即時影響因子@(工程，電氣和電子)學(xué)科排名


SCIE(SCI)期刊ACS Applied Electronic Materials(20 21 REV HIST)五年累積影響因子


SCIE(SCI)期刊ACS Applied Electronic Materials(ACS APPL ELECTRON MA)五年累積影響因子@(工程，電氣和電子)學(xué)科排名

Fulsome

Vulnerary

不能逃避

Submitted on: 04 September 2021. Revised on: 21 October 2021. Accepted on: 08 December 2021. ___________________ACS Applied Electronic Materials

菊花

conflate

Submitted on: 06 October 2021. Revised on: 01 December 2021. Accepted on: 19 December 2021. ___________________ACS Applied Electronic Materials

KIN

Submitted on: 11 February 2001. Revised on: 29 May 2001. Accepted on: 19 July 2001. ___________________ACS Applied Electronic Materials

deforestation

Submitted on: 29 January 2009. Revised on: 16 May 2009. Accepted on: 07 June 2009. ___________________ACS Applied Electronic Materials

強所

ureter