| 期刊全稱 | Auger- and X-Ray Photoelectron Spectroscopy in Materials Science | | 期刊簡稱 | A User-Oriented Guid | | 影響因子2023 | Siegfried Hofmann | | 視頻video | http://file.papertrans.cn/166/165498/165498.mp4 | | 發(fā)行地址 | This is the most comprehensive book available on this widely used analytical technique.Includes supplementary material: | | 學科分類 | Springer Series in Surface Sciences | | 圖書封面 |  | | 影響因子 | .To anyone who is interested in surface chemical analysis of materials on the nanometer scale, this book is prepared to give appropriate information. Based on typical application examples in materials science, a concise approach to all aspects of quantitative analysis of surfaces and thin films with AES and XPS is provided. Starting from basic principles which are step by step developed into practically useful equations, extensive guidance is given to graduate students as well as to experienced researchers. Key chapters are those on quantitative surface analysis and on quantitative depth profiling, including recent developments in topics such as surface excitation parameter and backscattering correction factor. Basic relations are derived for emission and excitation angle dependencies in the analysis of bulk material and of fractional nano-layer structures, and for both smooth and rough surfaces. It is shown how to optimize the analytical strategy, signal-to-noise ratio, certainty and detection limit. Worked examples for quantification of alloys and of layer structures in practical cases (e.g. contamination, evaporation, segregation and oxidation) are used to critically review diff | | Pindex | Book 2013 |
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