Titlebook: Alternative Lithography; Unleashing the Poten Clivia M. Sotomayor Torres Book 2003 Springer Science+Business Media New York 2003 electronic

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https://doi.org/10.1007/978-3-540-44736-8lithographic resolution. For lithographic mask production and patterning of features down to a few performance, electron beam lithography (EBL) is a well established technique. Transferring the mask pattern into resist on an industrial high throughput level is mainly the domain of optical lithograph