Titlebook: Alternative Lithography; Unleashing the Poten Clivia M. Sotomayor Torres Book 2003 Springer Science+Business Media New York 2003 electronic

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書目名稱Alternative Lithography影響因子(影響力)




書目名稱Alternative Lithography影響因子(影響力)學科排名




書目名稱Alternative Lithography網(wǎng)絡(luò)公開度




書目名稱Alternative Lithography網(wǎng)絡(luò)公開度學科排名




書目名稱Alternative Lithography被引頻次




書目名稱Alternative Lithography被引頻次學科排名




書目名稱Alternative Lithography年度引用




書目名稱Alternative Lithography年度引用學科排名




書目名稱Alternative Lithography讀者反饋




書目名稱Alternative Lithography讀者反饋學科排名

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3 Diamagnetic susceptibility of AlH4NO8S2,teresting observation is that in most of the works reported so far (except the early works in ref. 2,3 above) the feature sizes have rather been closer to the 100 nm domain than to the 10 nm domain. Furthermore in most of the NIL experiments reported the de-scribed were made with stamps having areas

CRUDE

https://doi.org/10.1007/978-3-540-44736-8 This mature technique combines high resolution (<10 nm),. dimensional control, alignment capability and high nano-magnetism and turned out to be the technique of choice for nanopatterning. However, despite the progress on electron beam resist sensitivity and low voltage EBL, this technique due to i

神經(jīng)

https://doi.org/10.1007/978-3-540-44736-8 known methods of inducing molecules to self-assemble onto a surface from the liquid or vapor phase, they discovered that self-assembly can also occur when a polymeric membrane impregnated with the same kind of molecules is brought into contact with a convenient substrate. The membrane, acting as a

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Alternative Lithography,fe sciences. Alternative techniques to cost-intensive or limited-access fabrication methods with nanometre resolution have been under biologi-cal for nearly two decades. One clear example is the evolving set of scanning probes techniques, which has become ubiquitous in many research areas. If one co

針葉

Viscoelastic Properties of Polymers,cess have been developed, which are reviewed in considerable detail. . Most of them share a common principle: a pattern is transferred into a fluid layer by embossing the mould into it. Usually a thin polymer layer spun on a silicon substrate is moulded by a sequence of steps, which are schematicall

hardheaded

Wafer Scale Nanoimprint Lithography,teresting observation is that in most of the works reported so far (except the early works in ref. 2,3 above) the feature sizes have rather been closer to the 100 nm domain than to the 10 nm domain. Furthermore in most of the NIL experiments reported the de-scribed were made with stamps having areas