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SCIE期刊IEEE TRANSACTIONS ON SEMICONDUCTOR MANUFACTURING 2024/2025影響因子:2.332 (IEEE T SEMICONDUCT M) (0894-6507). (PHYSICS

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發(fā)表于 2025-3-21 19:38:19 | 只看該作者 |倒序?yàn)g覽 |閱讀模式
期刊全稱IEEE TRANSACTIONS ON SEMICONDUCTOR MANUFACTURING
期刊簡稱IEEE T SEMICONDUCT M
影響因子20242.332
視頻videohttp://file.papertrans.cn/13/12075/12075.mp4
ISSN0894-6507
eISSN1558-2345
出版商IEEE-INST ELECTRICAL ELECTRONICS ENGINEERS INC
發(fā)行地址445 HOES LANE, PISCATAWAY, USA, NJ, 08855-4141
學(xué)科分類1.Science Citation Index Expanded (SCIE)--Engineering, Manufacturing | Engineering, Electrical & Electronic | Physics, Applied | Physics, Condensed Matter; 2.Current Contents Electronics & Telecommunications Collection--Semiconductors & Solid State Materials Technology; 3.Current Contents Engineering, Computing & Technology--Electrical & Electronics Engineering; 4.Essential Science Indicators--Engineering;
出版語言English
The information of publication is updating

SCIE(SCI)期刊IEEE TRANSACTIONS ON SEMICONDUCTOR MANUFACTURING(20 21 REV HIST)影響因子


SCIE(SCI)期刊IEEE TRANSACTIONS ON SEMICONDUCTOR MANUFACTURING(IEEE T SEMICONDUCT M)影響因子@(凝聚態(tài)物理學(xué))學(xué)科排名


SCIE(SCI)期刊IEEE TRANSACTIONS ON SEMICONDUCTOR MANUFACTURING(20 21 REV HIST)總引論文


SCIE(SCI)期刊IEEE TRANSACTIONS ON SEMICONDUCTOR MANUFACTURING(IEEE T SEMICONDUCT M)總引論文@(凝聚態(tài)物理學(xué))學(xué)科排名


SCIE(SCI)期刊IEEE TRANSACTIONS ON SEMICONDUCTOR MANUFACTURING(20 21 REV HIST)影響因子


SCIE(SCI)期刊IEEE TRANSACTIONS ON SEMICONDUCTOR MANUFACTURING(IEEE T SEMICONDUCT M)總引頻次@(凝聚態(tài)物理學(xué))學(xué)科排名


SCIE(SCI)期刊IEEE TRANSACTIONS ON SEMICONDUCTOR MANUFACTURING(20 21 REV HIST)即時影響因子


SCIE(SCI)期刊IEEE TRANSACTIONS ON SEMICONDUCTOR MANUFACTURING(IEEE T SEMICONDUCT M)即時影響因子@(凝聚態(tài)物理學(xué))學(xué)科排名


SCIE(SCI)期刊IEEE TRANSACTIONS ON SEMICONDUCTOR MANUFACTURING(20 21 REV HIST)五年累積影響因子


SCIE(SCI)期刊IEEE TRANSACTIONS ON SEMICONDUCTOR MANUFACTURING(IEEE T SEMICONDUCT M)五年累積影響因子@(凝聚態(tài)物理學(xué))學(xué)科排名


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沙發(fā)
發(fā)表于 2025-3-21 21:46:55 | 只看該作者
板凳
發(fā)表于 2025-3-22 00:37:25 | 只看該作者
Submitted on: 23 October 1998. Revised on: 11 January 1999. Accepted on: 12 March 1999. ___________________IEEE TRANSACTIONS ON SEMICONDUCTOR MANUFACTURING
地板
發(fā)表于 2025-3-22 05:49:53 | 只看該作者
Submitted on: 28 November 2024. Revised on: 03 March 2025. Accepted on: 30 March 2025. ___________________IEEE TRANSACTIONS ON SEMICONDUCTOR MANUFACTURING
5#
發(fā)表于 2025-3-22 09:44:23 | 只看該作者
6#
發(fā)表于 2025-3-22 15:36:03 | 只看該作者
Submitted on: 23 December 2003. Revised on: 03 March 2004. Accepted on: 19 April 2004. ___________________IEEE TRANSACTIONS ON SEMICONDUCTOR MANUFACTURING
7#
發(fā)表于 2025-3-22 19:34:34 | 只看該作者
Submitted on: 11 December 2004. Revised on: 21 February 2005. Accepted on: 06 April 2005. ___________________IEEE TRANSACTIONS ON SEMICONDUCTOR MANUFACTURING
8#
發(fā)表于 2025-3-22 22:50:43 | 只看該作者
Submitted on: 12 February 2018. Revised on: 27 March 2018. Accepted on: 09 May 2018. ___________________IEEE TRANSACTIONS ON SEMICONDUCTOR MANUFACTURING
9#
發(fā)表于 2025-3-23 03:40:49 | 只看該作者
Submitted on: 12 April 2012. Revised on: 06 July 2012. Accepted on: 18 August 2012. ___________________IEEE TRANSACTIONS ON SEMICONDUCTOR MANUFACTURING
10#
發(fā)表于 2025-3-23 05:31:29 | 只看該作者
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