標(biāo)題: Titlebook: Evolution of Thin Film Morphology; Modeling and Simulat Matthew Pelliccione,Toh-Ming Lu Book 20081st edition Springer-Verlag New York 2008 [打印本頁] 作者: COAX 時間: 2025-3-21 16:14
書目名稱Evolution of Thin Film Morphology影響因子(影響力)
書目名稱Evolution of Thin Film Morphology影響因子(影響力)學(xué)科排名
書目名稱Evolution of Thin Film Morphology網(wǎng)絡(luò)公開度
書目名稱Evolution of Thin Film Morphology網(wǎng)絡(luò)公開度學(xué)科排名
書目名稱Evolution of Thin Film Morphology被引頻次
書目名稱Evolution of Thin Film Morphology被引頻次學(xué)科排名
書目名稱Evolution of Thin Film Morphology年度引用
書目名稱Evolution of Thin Film Morphology年度引用學(xué)科排名
書目名稱Evolution of Thin Film Morphology讀者反饋
書目名稱Evolution of Thin Film Morphology讀者反饋學(xué)科排名
作者: 不愿 時間: 2025-3-21 22:22 作者: Mobile 時間: 2025-3-22 01:23
Mounded Surfaces in nature. These investigations have been motivated by experimental results under certain types of deposition techniques including sputter deposition and chemical vapor deposition, most notably the measurement of growth exponents α, β, and . that are not consistent with the predictions of local gro作者: 死亡率 時間: 2025-3-22 08:01 作者: 蓋他為秘密 時間: 2025-3-22 12:47
Monte Carlo Simulationsimulus to a system in a somewhat random fashion, with the aim of discerning the general behavior of the system by averaging over the random process. This method is often used when more concrete numerical methods are unavailable or impractical.作者: Trigger-Point 時間: 2025-3-22 14:28 作者: Trigger-Point 時間: 2025-3-22 17:20
Ballistic Aggregation Modelsto the aggregate if a neighboring lattice point is occupied. This simple modification of a solid-on-solid model can lead to an interesting behavior of the resulting aggregate. We consider only on-lattice ballistic aggregation in this chapter, where the particles can aggregate in the constraints of a作者: ECG769 時間: 2025-3-22 22:38 作者: STING 時間: 2025-3-23 01:27 作者: 腐敗 時間: 2025-3-23 08:52
https://doi.org/10.1007/978-3-8349-6547-9imulus to a system in a somewhat random fashion, with the aim of discerning the general behavior of the system by averaging over the random process. This method is often used when more concrete numerical methods are unavailable or impractical.作者: conference 時間: 2025-3-23 11:34
Surface Statisticsat a position x on the surface at time .. The functional form of .(x, .) implies that there is only one surface height at position x, which may not hold for surfaces with overhangs. In the discussion that follows, the surface height profile is assumed to be a single-valued function.作者: 植物群 時間: 2025-3-23 14:45
Monte Carlo Simulationsimulus to a system in a somewhat random fashion, with the aim of discerning the general behavior of the system by averaging over the random process. This method is often used when more concrete numerical methods are unavailable or impractical.作者: rods366 時間: 2025-3-23 18:15
Erfolgsstrategien für Automobilzuliefererh, whereas on an atomic scale one would observe deep valleys and tall mountains in the landscape. Of particular scientific interest in the past few decades have been surfaces that exhibit this rough behavior on a nanometer scale, often referred to as thin film surfaces. Numerous studies have been ca作者: 狼群 時間: 2025-3-23 23:19 作者: arousal 時間: 2025-3-24 03:01 作者: 暫時休息 時間: 2025-3-24 09:34
https://doi.org/10.1007/978-3-322-89153-2re surface. The continuum growth models for shadowing and reemission discussed in Sect. 5.2 are often cumbersome, and leave significant room for improvement to a more concrete and accurate model. In this chapter, we discuss a new growth model based on small world network dynamics that will serve as 作者: CLOWN 時間: 2025-3-24 13:48 作者: chlorosis 時間: 2025-3-24 17:47 作者: Adenocarcinoma 時間: 2025-3-24 21:46 作者: 搖晃 時間: 2025-3-25 00:39
https://doi.org/10.1007/978-3-663-07203-4e literature. Instead, we hope to present a simplified view of the modeling techniques used to describe thin films grown by different experimental deposition techniques. In particular, we want to highlight the importance of nonlocal effects in thin film growth, as nonlocal effects are necessary to d作者: 增減字母法 時間: 2025-3-25 05:47
Beitr?ge zur ProduktionswirtschaftThe study of self-affine surfaces forms the basis for the continuum study of all thin film rough surfaces. It is in the context of self-affine surfaces where the description of the surface is simplest and most elegant, and the ideas used to describe self-affine surfaces can be generalized to more complex surfaces such as mounded surfaces.作者: 盡忠 時間: 2025-3-25 10:37
Self-Affine SurfacesThe study of self-affine surfaces forms the basis for the continuum study of all thin film rough surfaces. It is in the context of self-affine surfaces where the description of the surface is simplest and most elegant, and the ideas used to describe self-affine surfaces can be generalized to more complex surfaces such as mounded surfaces.作者: gospel 時間: 2025-3-25 14:15
Matthew Pelliccione,Toh-Ming LuPresents basic modeling and simulation tools for quantitative description of thin film morphological evolution.Displays clear conceptual developments in the fundamental understanding of complex surfac作者: Inflamed 時間: 2025-3-25 16:35
Springer Series in Materials Sciencehttp://image.papertrans.cn/e/image/317766.jpg作者: obsession 時間: 2025-3-25 22:18 作者: Emasculate 時間: 2025-3-26 02:16
978-1-4419-2580-0Springer-Verlag New York 2008作者: Anhydrous 時間: 2025-3-26 05:47
Evolution of Thin Film Morphology978-0-387-75109-2Series ISSN 0933-033X Series E-ISSN 2196-2812 作者: 死亡率 時間: 2025-3-26 11:26
0933-033X elopments in the fundamental understanding of complex surfacThin?lmdepositionisthemostubiquitousandcriticaloftheprocessesusedto manufacture high-tech devices such as microprocessors, memories, solar cells, microelectromechanicalsystems(MEMS),lasers,solid-statelighting,andp- tovoltaics. The morpholog作者: PTCA635 時間: 2025-3-26 13:50
https://doi.org/10.1007/978-3-322-89153-2vement to a more concrete and accurate model. In this chapter, we discuss a new growth model based on small world network dynamics that will serve as an example of how to analyze a continuum growth model.作者: cultivated 時間: 2025-3-26 20:18
https://doi.org/10.1007/978-3-663-20379-7ed in modeling thin film growth. More complicated models, including ballistic aggregation models, have been of interest as well, but illustrating the formulation and use of solid-on-solid models first gives insight into the advantages and drawbacks of both types of models. For more discussion regarding solid-on-solid models, see [40].作者: 舔食 時間: 2025-3-26 23:17 作者: APEX 時間: 2025-3-27 04:42 作者: 粗俗人 時間: 2025-3-27 05:37
Solid-on-Solid Modelsed in modeling thin film growth. More complicated models, including ballistic aggregation models, have been of interest as well, but illustrating the formulation and use of solid-on-solid models first gives insight into the advantages and drawbacks of both types of models. For more discussion regarding solid-on-solid models, see [40].作者: Fierce 時間: 2025-3-27 09:53 作者: poliosis 時間: 2025-3-27 15:54 作者: 持久 時間: 2025-3-27 18:30
Erfolgsstrategien für Automobilzuliefererhe electrical conductivity of thin metal films depends very much on surface and interface roughness [135], and the reliability of a Si MOSFET (metal-oxide-semiconductor fieldeffect transistor)channel depends on the roughness of the gate oxide—silicon interface [82]. Also, interface roughness has a p作者: Debate 時間: 2025-3-27 23:38
Nachhaltigkeit und Werte für den Erfolg and oblique angle deposition. Most local models predict a relatively small value for β, as represented by the small spread of β for local models, which is evident from Table 3.1. Clearly, local models are not able to explain many of the experimental measurements of β. To explain these results, the 作者: 偏狂癥 時間: 2025-3-28 03:38
https://doi.org/10.1007/978-3-663-07203-4e same graph, we also display a characteristic range of β values reported in experimental papers in the literature for different deposition techniques including thermal evaporation, sputter deposition, chemical vapor deposition, and oblique angle deposition. It appears that local models account for 作者: GENUS 時間: 2025-3-28 07:13
0933-033X toms are deposited on a surface, atoms do not arrive at the surface at the same time uniformly across the surface. This random ?uctuation, or noise, which is inherent to the deposition process, may create surfa978-1-4419-2580-0978-0-387-75109-2Series ISSN 0933-033X Series E-ISSN 2196-2812 作者: 感染 時間: 2025-3-28 11:48 作者: 不如樂死去 時間: 2025-3-28 18:40 作者: invade 時間: 2025-3-28 19:33
Concluding Remarkse same graph, we also display a characteristic range of β values reported in experimental papers in the literature for different deposition techniques including thermal evaporation, sputter deposition, chemical vapor deposition, and oblique angle deposition. It appears that local models account for 作者: 壁畫 時間: 2025-3-28 23:57
Book 20081st editionlibrium), which leads to a rough surface morphology and a complex temporal evolution. As atoms are deposited on a surface, atoms do not arrive at the surface at the same time uniformly across the surface. This random ?uctuation, or noise, which is inherent to the deposition process, may create surfa作者: 值得 時間: 2025-3-29 03:56
1567-7419 of Chapters I and 2, gives a general ouline of the problem and a history of the theories of evaporation from ancient times through the end of the nineteenth cen978-90-481-8365-4978-94-017-1497-6Series ISSN 1567-7419
