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標題: Titlebook: Ellipsometry for Industrial Applications; Karl Riedling Book 1988 Springer-Verlag/Wien 1988 circuit.ellipsometry.film.semiconductor.surfac [打印本頁]

作者: 突然    時間: 2025-3-21 19:38
書目名稱Ellipsometry for Industrial Applications影響因子(影響力)




書目名稱Ellipsometry for Industrial Applications影響因子(影響力)學(xué)科排名




書目名稱Ellipsometry for Industrial Applications網(wǎng)絡(luò)公開度




書目名稱Ellipsometry for Industrial Applications網(wǎng)絡(luò)公開度學(xué)科排名




書目名稱Ellipsometry for Industrial Applications被引頻次




書目名稱Ellipsometry for Industrial Applications被引頻次學(xué)科排名




書目名稱Ellipsometry for Industrial Applications年度引用




書目名稱Ellipsometry for Industrial Applications年度引用學(xué)科排名




書目名稱Ellipsometry for Industrial Applications讀者反饋




書目名稱Ellipsometry for Industrial Applications讀者反饋學(xué)科排名





作者: Abbreviate    時間: 2025-3-21 20:41

作者: 大罵    時間: 2025-3-22 02:55
(numerical) calibration procedures are given wherever possible, and design and operation guidelines for high-speed instruments suitable for dynamic "in situ" measurements are suggested.978-3-211-82040-7978-3-7091-8961-0
作者: 俗艷    時間: 2025-3-22 04:48

作者: 樸素    時間: 2025-3-22 08:52

作者: Excise    時間: 2025-3-22 15:05
in industrial areas, such as the technology of electronic devices, when simple instruments, many of them computer-controlled and automated, became available. The potential users of such instruments are, however, frequently aware neither of the inherent possibilities of this technique, nor of its ac
作者: Excise    時間: 2025-3-22 18:11

作者: Ossification    時間: 2025-3-23 00:39
Logic Approximating Sequences of Setschnique within the field of microelectronic technology concentrate on the investigation of semiconducting substrates and layers, and the modifications they undergo during various technological processes. In most cases, spectroscopic methods are applied.
作者: Mercurial    時間: 2025-3-23 03:35
http://image.papertrans.cn/e/image/307762.jpg
作者: Judicious    時間: 2025-3-23 08:27
Temporal Logic: Formulas, Models, Tableaux,Ellipsometric measurements are, like any experiment, subject to various error effects which may distort their results to a more or less critical degree.
作者: 生命    時間: 2025-3-23 10:47
Error Effects in Ellipsometric Investigations,Ellipsometric measurements are, like any experiment, subject to various error effects which may distort their results to a more or less critical degree.
作者: incredulity    時間: 2025-3-23 14:58
https://doi.org/10.1007/978-3-7091-8961-0circuit; ellipsometry; film; semiconductor; surface; surface analysis; thin films
作者: 有節(jié)制    時間: 2025-3-23 21:11
978-3-211-82040-7Springer-Verlag/Wien 1988
作者: vitreous-humor    時間: 2025-3-24 00:53
Logic Approximating Sequences of Setschnique within the field of microelectronic technology concentrate on the investigation of semiconducting substrates and layers, and the modifications they undergo during various technological processes. In most cases, spectroscopic methods are applied.
作者: accomplishment    時間: 2025-3-24 04:24

作者: separate    時間: 2025-3-24 07:59
Basics of Ellipsometry,t a monochromatic electromagnetic wave changes its state of polarization if it strikes non-perpendicularly the interface between two dielectric media. In general, any arbitrary monochromatic transversal wave can be considered composed of two orthogonal coherent waves with a fixed phase relation, e.g
作者: 細節(jié)    時間: 2025-3-24 12:54
Ellipsometry in Microelectronic Technology,chnique within the field of microelectronic technology concentrate on the investigation of semiconducting substrates and layers, and the modifications they undergo during various technological processes. In most cases, spectroscopic methods are applied.
作者: 原諒    時間: 2025-3-24 17:09
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