標(biāo)題: Titlebook: Automated Nanohandling by Microrobots; Sergej Fatikow (Professor, Dr.-Ing. habil.) Book 2008 Springer-Verlag London 2008 automatic control [打印本頁(yè)] 作者: FORAY 時(shí)間: 2025-3-21 18:17
書(shū)目名稱Automated Nanohandling by Microrobots影響因子(影響力)
書(shū)目名稱Automated Nanohandling by Microrobots影響因子(影響力)學(xué)科排名
書(shū)目名稱Automated Nanohandling by Microrobots網(wǎng)絡(luò)公開(kāi)度
書(shū)目名稱Automated Nanohandling by Microrobots網(wǎng)絡(luò)公開(kāi)度學(xué)科排名
書(shū)目名稱Automated Nanohandling by Microrobots被引頻次
書(shū)目名稱Automated Nanohandling by Microrobots被引頻次學(xué)科排名
書(shū)目名稱Automated Nanohandling by Microrobots年度引用
書(shū)目名稱Automated Nanohandling by Microrobots年度引用學(xué)科排名
書(shū)目名稱Automated Nanohandling by Microrobots讀者反饋
書(shū)目名稱Automated Nanohandling by Microrobots讀者反饋學(xué)科排名
作者: 溝通 時(shí)間: 2025-3-21 20:59 作者: tenosynovitis 時(shí)間: 2025-3-22 00:23
Automated Nanohandling by Microrobots978-1-84628-978-1Series ISSN 1860-5168 Series E-ISSN 2196-1735 作者: 生氣的邊緣 時(shí)間: 2025-3-22 05:00
https://doi.org/10.1007/978-88-470-1100-745 nm transistors for the year 2007. Using electron beam lithography, structures down to 10 nm are producible. But this will be the absolute lower limit for lithographic structuring, so that new materials have to be developed for a further miniaturization of structures.作者: 聾子 時(shí)間: 2025-3-22 11:40
https://doi.org/10.1007/978-88-470-1100-7etration of a body with a known geometry into the material’s surface. Both the force (or load) necessary for this penetration and the depth of indentation have to be measured, either separately or simultaneously.作者: installment 時(shí)間: 2025-3-22 13:21 作者: Original 時(shí)間: 2025-3-22 20:24 作者: Encapsulate 時(shí)間: 2025-3-23 01:12
,Un piccolo passo per l’umanità...,ovided by a global pose sensor, which could be a scanning electron microscope (SEM), a light microscope or a video camera. As described in the next section, the mobile microrobot’s pose controller contains several sequential subtasks that are performed before the signals that are applied to the micr作者: Concomitant 時(shí)間: 2025-3-23 04:57
https://doi.org/10.1007/978-88-470-1100-7on (Chapters 1 and 2), which makes the teleoperated or automated handling of nanoobjects possible. Because the object size is in the range of m, sub- m, and even down to a few nm, scanning electron microscopes (SEM) are increasingly employed to observe these processes. They allow enormous magnificat作者: nepotism 時(shí)間: 2025-3-23 06:45 作者: jaunty 時(shí)間: 2025-3-23 10:28 作者: CON 時(shí)間: 2025-3-23 15:11
https://doi.org/10.1007/978-88-470-1100-7ezers [1], dielectrophoresis [2], .. exist, not only would detailed commenting on every branch of biohandling go beyond the scope of this chapter, but also most of these techniques are well established, while AFM-based characterization and manipulation is a strongly developing area. A brief comparis作者: Duodenitis 時(shí)間: 2025-3-23 21:24 作者: CODE 時(shí)間: 2025-3-23 23:28
,Un piccolo passo per l’umanità..., this small scale have been developed. Until that time, manufacturing processes on the micrometer scale used to be the limit. Conventional semiconductor-processing technologies are mostly limited by the achievable resolution in lithography. However, this resolution depends on the wavelength of light作者: 隱語(yǔ) 時(shí)間: 2025-3-24 06:12
https://doi.org/10.1007/978-88-470-1100-7Within the last few years, a trend towards the automation of nanohandling processes has emerged. One key problem is the development of a global sensor to measure the position of handling tools and nanoobjects during the manipulation process. The sensor data is required as feedback to enable the closed-loop positioning of the tools and nanoobjects.作者: 啟發(fā) 時(shí)間: 2025-3-24 07:49
Real-time Object Tracking Inside an SEM,Within the last few years, a trend towards the automation of nanohandling processes has emerged. One key problem is the development of a global sensor to measure the position of handling tools and nanoobjects during the manipulation process. The sensor data is required as feedback to enable the closed-loop positioning of the tools and nanoobjects.作者: Incorporate 時(shí)間: 2025-3-24 12:36 作者: 諂媚于性 時(shí)間: 2025-3-24 17:51 作者: 牛馬之尿 時(shí)間: 2025-3-24 22:15 作者: 減震 時(shí)間: 2025-3-24 23:23
Material Nanotesting,etration of a body with a known geometry into the material’s surface. Both the force (or load) necessary for this penetration and the depth of indentation have to be measured, either separately or simultaneously.作者: Graduated 時(shí)間: 2025-3-25 07:15 作者: 小歌劇 時(shí)間: 2025-3-25 10:31 作者: Palatial 時(shí)間: 2025-3-25 15:35 作者: 芭蕾舞女演員 時(shí)間: 2025-3-25 18:01 作者: 驕傲 時(shí)間: 2025-3-25 20:40
https://doi.org/10.1007/978-88-470-1100-7 also most of these techniques are well established, while AFM-based characterization and manipulation is a strongly developing area. A brief comparison of AFM, dielectrophoresis and optical tweezer as manipulation and characterization methods for biological objects is given in Table 8.1.作者: Oafishness 時(shí)間: 2025-3-26 02:07 作者: 粗鄙的人 時(shí)間: 2025-3-26 08:04
Characterization and Handling of Biological Cells, also most of these techniques are well established, while AFM-based characterization and manipulation is a strongly developing area. A brief comparison of AFM, dielectrophoresis and optical tweezer as manipulation and characterization methods for biological objects is given in Table 8.1.作者: 性滿足 時(shí)間: 2025-3-26 10:15 作者: 迅速飛過(guò) 時(shí)間: 2025-3-26 16:42 作者: crockery 時(shí)間: 2025-3-26 18:24
,Un piccolo passo per l’umanità...,le objects. The number of applications for nanohandling and nanoassembly is expected to grow rapidly with the development of nanotechnology. The handling process is the precursor of the assembly process, hence, in this chapter, these expressions are used equally where not explicitly stated.作者: Dungeon 時(shí)間: 2025-3-26 21:47 作者: adjacent 時(shí)間: 2025-3-27 02:36
,Un piccolo passo per l’umanità..., materials structuring (often referred to as the bottom-up approach) or to extend the possibilities of common techniques, for example by using electromagnetic waves with considerably shorter wavelengths.作者: 冰雹 時(shí)間: 2025-3-27 07:03 作者: 躺下殘殺 時(shí)間: 2025-3-27 12:08
Robot-based Automated Nanohandling,le objects. The number of applications for nanohandling and nanoassembly is expected to grow rapidly with the development of nanotechnology. The handling process is the precursor of the assembly process, hence, in this chapter, these expressions are used equally where not explicitly stated.作者: 危機(jī) 時(shí)間: 2025-3-27 13:54 作者: Synchronism 時(shí)間: 2025-3-27 20:17
Nanostructuring and Nanobonding by EBiD, materials structuring (often referred to as the bottom-up approach) or to extend the possibilities of common techniques, for example by using electromagnetic waves with considerably shorter wavelengths.作者: Mortal 時(shí)間: 2025-3-28 01:12
Trends in Nanohandling,red positioning accuracy. The Greek word “nanos” (dwarf) refers to the physical unit of a nanometer = 1 nm = 10.m. In this book, we understand nanohandling as the manipulation of microscale and nanoscale objects of different nature with an accuracy in the (sub-) nanometer range, which may include th作者: SEED 時(shí)間: 2025-3-28 03:38 作者: 協(xié)奏曲 時(shí)間: 2025-3-28 07:51 作者: 缺乏 時(shí)間: 2025-3-28 12:14
3D Imaging System for SEM,on (Chapters 1 and 2), which makes the teleoperated or automated handling of nanoobjects possible. Because the object size is in the range of m, sub- m, and even down to a few nm, scanning electron microscopes (SEM) are increasingly employed to observe these processes. They allow enormous magnificat作者: 可耕種 時(shí)間: 2025-3-28 17:26
Force Feedback for Nanohandling,cess control. With dimensions of the parts to be handled of sometimes considerably less than 100 nm and with a typical positioning accuracy in the nanometer range, nanohandling applications have detached several orders of magnitude from the operators’ macroscopic realm of experience. Powerful sensor作者: DUST 時(shí)間: 2025-3-28 22:20
Characterization and Handling of Carbon Nanotubes,45 nm transistors for the year 2007. Using electron beam lithography, structures down to 10 nm are producible. But this will be the absolute lower limit for lithographic structuring, so that new materials have to be developed for a further miniaturization of structures.作者: GLARE 時(shí)間: 2025-3-28 23:45 作者: strain 時(shí)間: 2025-3-29 05:51
Material Nanotesting,etration of a body with a known geometry into the material’s surface. Both the force (or load) necessary for this penetration and the depth of indentation have to be measured, either separately or simultaneously.作者: 滲透 時(shí)間: 2025-3-29 08:44 作者: 有發(fā)明天才 時(shí)間: 2025-3-29 12:14
1860-5168 mber of R&D groups and companies all over the world. Controlled, reproducible assembly processes on the nanoscale will enable high-throughput manufacturing of revolutionary products and open up ne978-1-84628-978-1Series ISSN 1860-5168 Series E-ISSN 2196-1735 作者: PATHY 時(shí)間: 2025-3-29 16:44
